Christophe Fouquet
Analyst · UBS. Please go ahead
Thank you, Roger. Turning to technology. In EUV, we have achieved some important milestones on both the Low NA and the High NA platforms. These are critical steps in providing a comprehensive EUV product portfolio that offers the necessary flexibility to support our customers' roadmap requirements and optimize their cost of technology. Let me first update you on our Low NA NXE:3800E. We started to upgrade our systems in the field to its final 220 wafers per hour configuration this quarter, and we continue to roll out on the installed base fleet through 2025. We now ship all our new NXE:3800E system at full specification. In addition, our NXE:3800E maturity is reaching the level needed to support high volume manufacturing and several logic and memory customers are ramping their most advanced nodes using this system. The gain in productivity supports the execution of our cost of technology reduction roadmap with our customer, enabling more opportunities for EUV single expose adoption. This is especially relevant to DRAM as discussed at our Capital Markets Day. Let me turn now to High NA. At the SPIE Conference in February, there were a number of good results presented by our customers who highlighted the achievements of some key performance and maturity milestone. They also stressed the benefit of the technology in terms of process simplification, cost and cycle time reduction. Process simplification, leading to a fewer process steps, shorter cycle time, lower cost and better yield are the historical value driver of single expose lithography versus multi patterning. These benefits drove the industry transition to EUV Low NA and will drive the transition to High NA EUV over time. One paper showed that the High-NA system maturity is far ahead of what we experienced on Low NA at the same stage of its introduction, supporting a much lower risk of insertion and adoption for our customers. Intel reported the exposure of more than 30,000 wafer in one quarter and a significant process improvement by reducing the number of process steps from 40 to less than 10 on a given layer. With that comes a significant cycle time improvement. Samsung reported a 60% improvement in cycle time in one of their use cases as well. We shipped our fifth and final NXE:5000 High NA system in Q1 and now have system at three different customers. With the follow-on on High NA system model, the NXE:5200 shipping from Q2 this year. As we have described before, there are three phases of technology insertion our customer will follow with High NA. We are currently in phase one, where our customers take a system into their R&D facility and work with us to understand the value and capability of High NA for their next nodes. In phase two, which we expect to take place in 2026, 2027, customer will start running the system on 1-2 layers to test its readiness for volume manufacturing. And phase three, when customers design in High NA on their most critical layers, in their most advanced nodes and running volume manufacturing. Looking longer term, the semiconductor market remains strong with artificial intelligence, creating growth in recent quarters, and we see some of the future demand for AI solidifying, which is encouraging. Our conversations so far with customers -- our conversations so far with our customers confirm our expectation that both 2025 and 2026 will be growth year. At the same time, as Roger and I have already explained, there is an increased uncertainty across the global economy due to the ongoing discussion on tariffs. As discussed in our Capital Markets Day, we expect that the end market dynamics will lead to a product mix shift more towards advanced Logic and DRAM. The combination of our NXE:3800E product progress, our strong productivity roadmap on Low NA and the introduction of High NA will support the cost of technology reduction and the conversion of more multi-patterning layers to a single EUV exports, leading to higher litho intensity. In line with our 2024 Capital Market Day, we expect 2030 revenue opportunity between EUR44 billion and EUR60 billion, with gross margin expected between 56% and 60%. Finally, as a reminder, we host our Annual General Meeting on Wednesday, April 23, and we hope to welcome our shareholders again there. With that, we will be happy to take your question.